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Plasma Sources for Thin Film Deposition and Etching: Volume 18 on Hardback
Plasma Sources for Thin Film Deposition and Etching: Volume 18 on Hardback
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Plasma Sources for Thin Film Deposition and Etching: Volume 18

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Hardback
$225.00
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Description

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.
Release date NZ
September 29th, 1994
Audience
  • Professional & Vocational
Contributors
  • Edited by Maurice H. Francombe
  • Series edited by John L. Vossen
Country of Publication
United States
Imprint
Academic Press Inc
Pages
328
Publisher
Elsevier Science Publishing Co Inc
Dimensions
152x229x21
ISBN-13
9780125330183
Product ID
2606591

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Books >
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States of matter >
Condensed matter physics
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