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LPCVD Silicon Nitride and Oxynitride Films

Material and Applications in Integrated Circuit Technology
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Description

This volume reports on ESPRIT Project 369, which concentrated on material obtained by low pressure chemical vapour deposition (LPCVD), and involved measuring and comparing a large number of samples. The papers collected here provide a broad overview of the chemical and physical characteristics of silicon oxynitrides, with special emphasis on the way in which these properties influence the electrical characteristics and behaviour of oxynitrides. The aim of the text is to provide materials scientists and integrated circuit technologists with enough information to consider this class of materials for application in integrated circuit technology.
Release date NZ
May 28th, 1991
Audiences
  • Postgraduate, Research & Scholarly
  • Professional & Vocational
Contributor
  • Edited by F.H.P.M. Habraken
Edition
Softcover reprint of the original 1st ed. 1991
Illustrations
1 Illustrations, black and white; X, 159 p. 1 illus.
Pages
159
Dimensions
170x244x9
ISBN-13
9783540539544
Product ID
14278733

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