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This text draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It encompasses all the links in the progress from fundamentals to applications, the description and modelling of different plasma sources to technological use, from general diagnostics to methods related to technological control and operation of plasma reactors. The book lays a foundation for the application of sources in industry (in high-tech electronics, microelectronics, IC fabrication, plasma chemistry, lighting, new materials, optics, the biomedical industry, and aerospace), and in astrophysics, atomic physics, laser physics, accelerator physics and microwave devices.
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