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Nanolithography

A Borderland between STM, EB, IB, and X-Ray Lithographies
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Description

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Release date NZ
December 5th, 2010
Audience
  • Professional & Vocational
Contributors
  • Edited by Carlo Giovannella
  • Edited by M. Gentili
  • Edited by Stefano Selci
Edition
Softcover reprint of hardcover 1st ed. 1994
Illustrations
XII, 216 p.
Pages
216
Dimensions
155x235x12
ISBN-13
9789048143887
Product ID
8963037

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